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    <!-- http://purl.obolibrary.org/obo/CHMO_0001391 -->

    <Class rdf:about="http://purl.obolibrary.org/obo/CHMO_0001391">
        <rdfs:label>nanolithography</rdfs:label>
    </Class>
    


    <!-- http://purl.obolibrary.org/obo/CHMO_0001392 -->

    <Class rdf:about="http://purl.obolibrary.org/obo/CHMO_0001392">
        <rdfs:label>nanoimprint lithography</rdfs:label>
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        <oboInOwl:hasExactSynonym>nano-imprinting lithography</oboInOwl:hasExactSynonym>
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        <ns3:IAO_0000115>A synthesis technique that uses mechanical deformation to transfer a pattern to a substrate. A solution of resist (a polymer) is deposited on the substrate by spin coating. A mould containing the desired (nanosized) pattern on its surface is then pressed into the resist and any residual resist in the cast area is removed by an anisotropic etching process such as reactive ion etching.</ns3:IAO_0000115>
        <oboInOwl:hasExactSynonym>NIL</oboInOwl:hasExactSynonym>
        <oboInOwl:hasExactSynonym>nanoimprinting lithography</oboInOwl:hasExactSynonym>
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