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    <!-- http://purl.obolibrary.org/obo/CHMO_0001392 -->

    <Class rdf:about="http://purl.obolibrary.org/obo/CHMO_0001392">
        <rdfs:label>nanoimprint lithography</rdfs:label>
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    <!-- http://purl.obolibrary.org/obo/CHMO_0001394 -->

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        <rdfs:label>laser-assisted direct imprint lithography</rdfs:label>
        <rdfs:subClassOf rdf:resource="http://purl.obolibrary.org/obo/CHMO_0001392"/>
        <oboInOwl:hasExactSynonym>laser-assisted direct imprint</oboInOwl:hasExactSynonym>
        <oboInOwl:hasExactSynonym>laser assisted direct imprinting</oboInOwl:hasExactSynonym>
        <oboInOwl:hasExactSynonym>LADI</oboInOwl:hasExactSynonym>
        <ns3:IAO_0000115>A synthesis technique that uses mechanical deformation to transfer a pattern to a substrate. A solution of photosensitive resist (a polymer) is deposited on a silicon substrate by spin coating. A transparent stamp (e.g. quartz) containing the desired (nanosized) pattern on its surface is then pressed into the resist and a single laser pulse (XeCl excimer laser) is applied to melt the top layer of silicon. The molten silicon flows into the pattern then rapidly solidifies.</ns3:IAO_0000115>
        <oboInOwl:hasExactSynonym>laser assisted direct imprint lithography</oboInOwl:hasExactSynonym>
        <oboInOwl:hasExactSynonym>laser assisted direct imprint</oboInOwl:hasExactSynonym>
        <oboInOwl:hasExactSynonym>laser-assisted direct imprinting</oboInOwl:hasExactSynonym>
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