thermoplastic nanoimprint lithography lithographically induced self-assembly CHMO:0001396 lithographically-induced self-assembly A synthesis technique that uses mechanical deformation to transfer a pattern to a substrate. A solution of resist (a thermoplastic polymer) is deposited on the substrate by spin coating. A mould containing the desired (nanosized) pattern on its surface is then held above the resist, whilst both the substrate and mould are heated to the glass transition temperature of the polymer. The resist is then cooled and any residual resist in the cast area is removed by an anisotropic etching process such as reactive ion etching. During the heat–cool cycle the initially flat polymer film self-assembles into periodic supramolecular pillar arrays. LISA