thermoplastic nanoimprint lithography roller nanoimprint lithography A synthesis technique that uses mechanical deformation to transfer a pattern to a substrate. A solution of resist (a thermoplastic polymer) is deposited on the substrate by spin coating. A stamp containing the desired (nanosized) pattern on its surface is placed on the substrate. A roller, heated to the glass transition temperature of the resist, is then used to press the stamp into the resist. The resist is cooled and any residual resist in the cast area is removed by an anisotropic etching process such as reactive ion etching. CHMO:0001397