photo nanoimprint lithography step-and-flash imprint lithography CHMO:0001399 A synthesis technique that uses mechanical deformation and cross-linking to transfer a pattern to a substrate. A solution of photosensitive organosilicon resist (a polymer) is deposited on the substrate by spin coating. A transparent stamp (e.g. quartz) containing the desired (nanosized) pattern on its surface is then pressed into the resist, which is exposed to UV light. Any unexposed areas of polymer are removed by reactive ion etching. step and flash imprint lithography SFIL