lithography near-field phase shift lithography CHMO:0001409 near field phase shift lithography A synthesis method that uses light to transfer a pattern to a substrate. A solution of photoresist (a polymer) is deposited on the substrate by spin coating. A transparent PDMS mask with the desired pattern (in relief) on its surface is placed in contact with the photoresist layer. UV light (300–460 nm) is then used to cross-link the polymer. Light passing through the stamp is modulated in the near-field by the relief of the mask such that the edges of the relief structures correspond to nulls in the intensity of the light. The polymer is cross-linked in the remaining areas. near-field photolithography near field optical lithography NFPSL near-field optical lithography near-field phase-shift lithography near-field conformational photolithography near field photolithography