<?xml version="1.0"?>
<?xml-stylesheet type="text/xsl" href="https://ontobee.org/ontology/view/CHMO?iri=http://purl.obolibrary.org/obo/CHMO_0001572"?>
<rdf:RDF xmlns="http://www.w3.org/2002/07/owl#"
     xml:base="http://www.w3.org/2002/07/owl"
     xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
     xmlns:owl="http://www.w3.org/2002/07/owl#"
     xmlns:oboInOwl="http://www.geneontology.org/formats/oboInOwl#"
     xmlns:xsd="http://www.w3.org/2001/XMLSchema#"
     xmlns:rdfs="http://www.w3.org/2000/01/rdf-schema#"
     xmlns:foaf="http://xmlns.com/foaf/0.1/"
     xmlns:dc="http://purl.org/dc/elements/1.1/"
     xmlns:ns3="http://purl.obolibrary.org/obo/">
    


    <!-- 
    ///////////////////////////////////////////////////////////////////////////////////////
    //
    // Annotation properties
    //
    ///////////////////////////////////////////////////////////////////////////////////////
     -->

    <AnnotationProperty rdf:about="http://www.geneontology.org/formats/oboInOwl#hasExactSynonym"/>
    <AnnotationProperty rdf:about="http://purl.obolibrary.org/obo/IAO_0000115"/>
    <AnnotationProperty rdf:about="http://www.geneontology.org/formats/oboInOwl#id"/>
    


    <!-- 
    ///////////////////////////////////////////////////////////////////////////////////////
    //
    // Datatypes
    //
    ///////////////////////////////////////////////////////////////////////////////////////
     -->

    


    <!-- 
    ///////////////////////////////////////////////////////////////////////////////////////
    //
    // Classes
    //
    ///////////////////////////////////////////////////////////////////////////////////////
     -->

    


    <!-- http://purl.obolibrary.org/obo/CHMO_0001571 -->

    <Class rdf:about="http://purl.obolibrary.org/obo/CHMO_0001571">
        <rdfs:label>wet etching</rdfs:label>
    </Class>
    


    <!-- http://purl.obolibrary.org/obo/CHMO_0001572 -->

    <Class rdf:about="http://purl.obolibrary.org/obo/CHMO_0001572">
        <rdfs:label>anisotropic wet etching</rdfs:label>
        <rdfs:subClassOf rdf:resource="http://purl.obolibrary.org/obo/CHMO_0001571"/>
        <ns3:IAO_0000115>The process of using strong acids/alkalis to remove a thin layer of the unprotected parts of a sample surface (e.g. metal or silicon) to create a pattern. Anisotropic etching occurs when different etch rates are observed in different directions in the sample (e.g. for different crystal faces).</ns3:IAO_0000115>
        <oboInOwl:hasExactSynonym>wet anisotropic etching</oboInOwl:hasExactSynonym>
        <oboInOwl:id>CHMO:0001572</oboInOwl:id>
    </Class>
</rdf:RDF>



<!-- Generated by the OWL API (version 3.2.4.1806) http://owlapi.sourceforge.net -->



