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    <!-- http://purl.obolibrary.org/obo/CHMO_0001770 -->

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        <rdfs:label>deep-level transient spectroscopy</rdfs:label>
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    <!-- http://purl.obolibrary.org/obo/CHMO_0001773 -->

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        <rdfs:label>current deep-level transient spectroscopy</rdfs:label>
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        <oboInOwl:creation_date>2009-05-20T11:15:51Z</oboInOwl:creation_date>
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        <ns3:IAO_0000115>A method for determining the extent of intrinsic and process-induced defects in the  crystalline layers within  semiconductor devices. Defects arising from impurities, grain boundaries, interfaces, etc. result in the creation of traps that capture free electrons and holes. By monitoring the current produced when applying a voltage pulse to the semiconductor junction at different temperatures, spectra are generated which exhibit a peak for each &#39;deep level&#39; (each energy level near the center of the band gap). The height of the peak is proportional to the defect density and the emission rate and temperature dependence are characteristic for each type of defect.</ns3:IAO_0000115>
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