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    <!-- http://purl.obolibrary.org/obo/CHMO_0002430 -->

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        <rdfs:label>UV-assisted capillary force lithography</rdfs:label>
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    <!-- http://purl.obolibrary.org/obo/CHMO_0002431 -->

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        <rdfs:label>two-step UV-assisted capillary force lithography</rdfs:label>
        <rdfs:subClassOf rdf:resource="http://purl.obolibrary.org/obo/CHMO_0002430"/>
        <oboInOwl:hasExactSynonym>two-step UV-assisted CFL</oboInOwl:hasExactSynonym>
        <oboInOwl:hasExactSynonym>two-step UV-assisted capillary force lithography (CFL)</oboInOwl:hasExactSynonym>
        <oboInOwl:creation_date>2009-09-22T11:37:33Z</oboInOwl:creation_date>
        <ns3:IAO_0000115>A process for shaping pliable thermoplastic polymers. An elastomeric (polyurethane acrylate) mould is placed on a UV-curable polymer that has been spin- or drop-coated onto a substrate and partially cured using UV light (200–400 nm). Capillary force allows the polymer melt to fill up the void space between the polymer and the mould, generating a negative replica of the mould pattern. The process is repeated with a second mould and exposure to UV light. Two-step UV-assisted capillary force lithography is used to generate micro/nanoscale combined hierarchical structures.</ns3:IAO_0000115>
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